Carbon nanostructure coating on carbon/carbon composite by Plasma Assisted Chemical Vapor Deposition

In order to eliminate the infirmity of carbon/carbon composite such as low temperature oxidation andoptimize the interfaces in carbon fiber reinforced ceramic composites, a thin layer of carbon nanostructure has beendeveloped by a Plasma Assisted Chemical Vapor Deposition (PACVD) process operating at reduced temperature on C/Ccomposite. C/C composite with grade of T300-3K (Torayca Company) was chosen as substrate, argon and methane gaswas considered as career and reactant gas, respectively. After cleaning the surface of sample with argon Plasma, theprocess of coating by flow of Methane (15 sccm flow rate) and Argon (45 sccm flow rate) was done in 30 minutes and 2amperes pulse direct current in 170°C. XRD test for detecting the structure of layer and FE-SEM analysis forcharacterizing of coating morphology were done. FE-SEM studies showed that the thickness of layer was about 70 to90nm and XRD revealed the structure of thin film was nano-crystalline carbon. Raman spectroscopy was conducted todetermine types of deposited carbon bonds, it was calculated that the sp3 contents in carbon nanostructure coating were32.8%, It means that this nanostructure of carbon is Diamond Like Carbon (DLC).

کلیدواژه ها:

Carbon nanostructure ، Carbon/Carbon composite ، plasma ، coating ،