Analysis and optimization of Tunnel FET with Band gap Engineering
عنوان مقاله: Analysis and optimization of Tunnel FET with Band gap Engineering
شناسه ملی مقاله: ICEE21_225
منتشر شده در بیست و یکمین کنفرانس مهندسی برق ایران در سال 1392
شناسه ملی مقاله: ICEE21_225
منتشر شده در بیست و یکمین کنفرانس مهندسی برق ایران در سال 1392
مشخصات نویسندگان مقاله:
M. R. Salehi - Shiraz university of technology
E Abiri - Shiraz university of technology
S. E. Hosseini - Ferdowsi university of Mashad
B. Dorostkar - Shiraz university of technology
خلاصه مقاله:
M. R. Salehi - Shiraz university of technology
E Abiri - Shiraz university of technology
S. E. Hosseini - Ferdowsi university of Mashad
B. Dorostkar - Shiraz university of technology
in this paper a high performance double gate tunnel field effect transistor (DG-TFET) is proposed. Band gap engineering is achieved in order to improve the device performance. This novelTFET is formed from variable band gap materials with 20 nm channel length to enhance on current and reach to low off-current.With precise selection of mole fraction in materials, and are designated to all region in the device and important characterises of TFET areoptimized. Low sub threshold swing below 60 mv/dec ratio as high as 10
کلمات کلیدی: band-to-band tunneling, high-k dielectric, Double-gate, gated p-i-n diode, sub threshold swing,tunneling transistor
صفحه اختصاصی مقاله و دریافت فایل کامل: https://civilica.com/doc/208282/